[1] A PIRATI, J V SCHOOT, K TROOST et al. The future of EUV lithography： enabling Moore's Law in the next decade. Advanced Lithography, 10143, 101430G(2017).

[2] A F RUDD, M J WARD. Laser transducer systems for high-accuracy machine positioning. Hewlett Packard Journal, 27, 2-6(1976).

[3] Feng CHI, Yu ZHU, Zhiping ZHANG等. Environment compensation technologies in dual-frequency laser interferometer measurement system. Chinese Journal of Lasers, 41, 190-196(2014).

[4] T CASTENMILLER, F V D MAST, T D KORT et al. Towards ultimate optical lithography with NXT：1950i dual stage immersion platform. Advanced Lithography, 7640, 76401N(2010).

[5] Guochao WANG, Shuhua YAN, L GAO等. Development of displacement measurement technologies based on grating interferometry. Laser Technology, 34, 661-664+716(2010).

[6] K AKIHIRO. Optical displacement measurement system. US.

[7] Fang CHENG, K C FAN. Linear diffraction grating interferometer with high alignment tolerance and high accuracy. Applied Optics, 50, 4550-4556(2011).

[9] K C FAN, B K LI, C H LIU. A diffraction grating scale for long range and nanometer resolution, 7133, 44-48(2008).

[10] Jinlei GAO, Mingcheng ZONG. Development of symmetrical double-grating interferometric displacement measuring system. Chinese Journal of Lasers, 43, 126-132(2016).

[11] Shenghuai WANG, Xudong YANG, Tiebang XIE. Principle and application of double diffraction grating displacement sensor. Metrology Technology, 7-10(2008).

[13] J DENG, X YAN, C WEI et al. Eightfold optical encoder with high-density grating. Applied Optics, 57, 2366(2018).

[15] X MAO, L ZENG. Design and fabrication of crossed gratings with multiple zero-reference marks for planar encoders. Measurement Science and Technology, 29(2018).