[1] [1] Li E, Cui Z, Dai Y, et al. Appl. Ssurf. Sci., 2011, 257: 10850.

[2] [2] Fu S L, Chen J F, Zhang H B, et al. J. Cryst. Growth, 2009, 311: 3325.

[4] [4] Fu S L, Chen J F, Hu S J, et al. Plasma Sources Sci. Technol., 2006, 15: 187.

[6] [6] Vinogradov I P. Plasma Sources Sci. Technol., 1999, 8: 299.

[7] [7] Jordan D C, Tsong I S T, Smith D J, et al. Appl. Phys. Lett., 2000, 77: 3030.

[8] [8] Pu Y K, Ren Y F, Yang S Z, et al. Surf. Coat. Technol., 2000, 131: 470.

[9] [9] Koukitu A, Seki H. Appl. Phys. Lett., 1980, 49: 325.

[10] [10] Chiba Y, Shimizu Y, Tominari T, et al. J. Cryst. Growth, 1998, 189/190: 317.

[11] [11] Nicolazo F, Goullet A, Granier, et al. Surf. Coat. Technol., 1998, 98: 1578.

[12] [12] Thomas L, Maille L, Badie J M, et al. Surf. Coat. Technol., 2001, 142-144: 314.

[13] [13] Zambrano G, Riascos I, Prieto P, et al. Surf. Coat. Technol., 2003, 172: 144.