Spectroscopy and Spectral Analysis, Volume. 33, Issue 4, 1108(2013)

Optical Emission Analyses of N2/TMG ECR Plasma for Deposition of GaN Film

FU Si-lie1、*, WANG Chun-an2, and CHEN Jun-fang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    The optical emission spectroscopy of hybrid N2/trimethylgallium (TMG) plasma in an ECR-PECVD system was investigated. The results indicate that the TMG gas is strongly dissociated into Ga*, CH and H even under self-heating condition. Ga species and nitrogen molecule in metastable state are dominant in hybrid ECR plasma. The concentration of metastable nitrogen molecule increases with the microwave power. On the other hand, the concentration of excited nitrogen molecules and of nitrogen ion decreases when the microwave power is higher than 400 W.

    Tools

    Get Citation

    Copy Citation Text

    FU Si-lie, WANG Chun-an, CHEN Jun-fang. Optical Emission Analyses of N2/TMG ECR Plasma for Deposition of GaN Film[J]. Spectroscopy and Spectral Analysis, 2013, 33(4): 1108

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Received: Sep. 3, 2012

    Accepted: --

    Published Online: Apr. 8, 2013

    The Author Email: Si-lie FU (fusl@scnu.edu.cn)

    DOI:10.3964/j.issn.1000-0593(2013)04-1108-04

    Topics