Acta Photonica Sinica, Volume. 35, Issue 10, 1608(2006)

A Novel Two-Step Alignment Technique for Imprint Lithography

Wang Li*... Lu Bingheng, Ding Yucheng and Liu Hongzhong |Show fewer author(s)
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    References(6)

    [1] [1] Stephen A C. The science and engineering of microelectronic fabrication,second edition,New York:Oxford University Press,2001.17~18

    [2] [2] Chou S Y,Chris K. Ultrafast and direct imprint of nanostructures in silicon. Nature,2002,417(20):835~838

    [3] [3] Otto M. Characterization and application of a UV-based imprint technique. Microelectronic Engineering,2001,57(9):361~366

    [4] [4] James R S,Bruce W S. Microlithography: science and technology. New York: Marcel Dekker Inc,1998.317~367

    [5] [5] Liu Z W,Xie H M,Fang D N,et al. Acta Photonica Sinica,2005,34(9):1431~1433

    [6] [6] Tang X G,Gao F H,Gao F,et al. Acta Photonica Sinica,2005,34(6):881~884

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    Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608

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    Paper Information

    Category:

    Received: Jul. 6, 2005

    Accepted: --

    Published Online: Jun. 3, 2010

    The Author Email: Li Wang (wangli@mailst.xjtu.ed.cn)

    DOI:

    CSTR:32186.14.

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