Acta Photonica Sinica, Volume. 35, Issue 10, 1608(2006)
A Novel Two-Step Alignment Technique for Imprint Lithography
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Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608
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Received: Jul. 6, 2005
Accepted: --
Published Online: Jun. 3, 2010
The Author Email: Li Wang (wangli@mailst.xjtu.ed.cn)
CSTR:32186.14.
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