Journal of Semiconductors, Volume. 45, Issue 11, 112502(2024)
First demonstration of a self-aligned p-channel GaN back gate injection transistor
Fig. 1. (Color online) (a) The schematic view and SEM images of self-aligned p-channel GaN back gate injection transistors (SA-BGITs) with 2DEG as the gate; (b) schematic process flow of the SA-BGITs. (c) I−V curves of p-type Ohmic contacts and (d) n-type Ohmic contacts in the form of TLM patterned on the heterostructure.
Fig. 2. (Color online) (a) DC dual-sweep transfer curves of SA-BGITs (LG = 3 μm) measured at VDS of −1 V. (b) The increase in IG lead to an increase in power consumption in CL.
Fig. 3. (Color online) (a) Output characterizes of SA-BGITs (LG = 3 μm) measured at moderate gate bias. (b) Output characterizes of SA-BGITs with LG of 1 μm (purple), 2 μm (blue), and 3 μm (red). (c) The gate breakdown of SA-BGITs (LG = 3 μm).
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Yingjie Wang, Sen Huang, Qimeng Jiang, Jiaolong Liu, Xinhua Wang, Wen Liu, Liu Wang, Jingyuan Shi, Jie Fan, Xinguo Gao, Haibo Yin, Ke Wei, Xinyu Liu. First demonstration of a self-aligned p-channel GaN back gate injection transistor[J]. Journal of Semiconductors, 2024, 45(11): 112502
Category: Research Articles
Received: May. 17, 2024
Accepted: --
Published Online: Dec. 23, 2024
The Author Email: Huang Sen (SHuang), Jiang Qimeng (QMJiang)