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Spectroscopy and Spectral Analysis, Volume. 36, Issue 4, 1261(2016)

In Situ Raman Spectrum Peak Test of Monocrystalline Silicon Wafer under Quantitative Uniaxial Pressure

XIE Chao1... DU Jian-guo1, LIU Lei1, YI Li1, LIU Hong1, CHEN Zhi1 and LI Jing2 |Show fewer author(s)
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    XIE Chao, DU Jian-guo, LIU Lei, YI Li, LIU Hong, CHEN Zhi, LI Jing. In Situ Raman Spectrum Peak Test of Monocrystalline Silicon Wafer under Quantitative Uniaxial Pressure[J]. Spectroscopy and Spectral Analysis, 2016, 36(4): 1261

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    Paper Information

    Received: May. 15, 2015

    Accepted: --

    Published Online: Dec. 20, 2016

    The Author Email:

    DOI:10.3964/j.issn.1000-0593(2016)04-1261-05

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology