Journal of Semiconductors, Volume. 44, Issue 12, 122001(2023)

Controllable growth of wafer-scale PdS and PdS2 nanofilms via chemical vapor deposition combined with an electron beam evaporation technique

Hui Gao1, Hongyi Zhou1, Yulong Hao2, Guoliang Zhou3, Huan Zhou1, Fenglin Gao1, Jinbiao Xiao1, Pinghua Tang1, and Guolin Hao1,4、*
Author Affiliations
  • 1School of Physics and Optoelectronics and Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, China
  • 2College of Physics and Technology & Guangxi Key Laboratory of Nuclear Physics and Technology, Guangxi Normal University, Guilin 541004, China
  • 3Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield S10 2TN, UK
  • 4National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China
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    Hui Gao, Hongyi Zhou, Yulong Hao, Guoliang Zhou, Huan Zhou, Fenglin Gao, Jinbiao Xiao, Pinghua Tang, Guolin Hao. Controllable growth of wafer-scale PdS and PdS2 nanofilms via chemical vapor deposition combined with an electron beam evaporation technique[J]. Journal of Semiconductors, 2023, 44(12): 122001

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    Paper Information

    Category: Articles

    Received: Jun. 11, 2023

    Accepted: --

    Published Online: Mar. 13, 2024

    The Author Email: Hao Guolin (GLHao)

    DOI:10.1088/1674-4926/44/12/122001

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