Optics and Precision Engineering, Volume. 18, Issue 2, 420(2010)

Microneedle array and mask compensation based on X-ray lithography

CHEN Shao-jun1、*, LI Yi-gui1, and SUGIYAMA Susumu2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(12)

    [1] [1] BECKER E, EHRFELD W, HAGMANN P, et al.. Fabrication of microstructures with high aspect ratios by LIGA process [J].Microelectron.Eng.,1986:35-56.

    [2] [2] LIANG J Q, YAO J S. The study LIGA technology[J]. Opt.Precision Eng., 2000,8 (1):38-41.(in Chinese)

    [3] [3] BLEY P. The LIGA process for fabrication of 3D micro-scale structures [J]. Interdisc. Sci. Rev.,1993,18(4):267-272.

    [4] [4] FU L, MIAO J M, LI X X, et al.. Study of silicon for deep etching micro-gyroscope fabrication [J]. Appl. Surface Sci., 2001,177(1-2):78-84.

    [5] [5] CHABLOZ M,SAKAI Y,MATSUURA T,et al.. Improvement of sidewall roughness in deep silicon etching [J]. Microsyst. Technol.,2000,6(3):86-89.

    [6] [6] MING P M, ZHU D, HU Y, et al.. Fabrication of nickel soft contact microprobe based on UV-LIGA[J]. Opt. Precision Eng., 2006,15(5):735-740.(in Chinese)

    [7] [7] GREGORY P B, MICHAEL T D. Excimer laser micromachining for rapid fabrication of diffractive optical elements [J]. Applied Optics, 1997,36(20):4666-4674.

    [9] [9] SUSUMU S, SOMMAWAN K, GAKU K. Plane-pattern to cross-section transfer (PCT) technique for deep x-ray lithography and applications [J]. J.Micromec.Microeng, 2004,10:1394-1404.

    [10] [10] JIA SH H, LI Y G, ZHU J, et al.. A new low-cost fabrication method for micro mechanical system microneedles [J]. Journal of Xi’an Jiaotong University, 2007,41(5):589-592.(in Chinese)

    [11] [11] SUN X, JIA SH H, ZHU J, et al.. Design and mechanical characteristics of novel MEMS microneedles [J]. Chinese Journal of Semiconductors, 2007,28(1):113-116.(in Chinese)

    [12] [12] KIM K, PARK D S, LU H M. A tapered hollow metallic microneedle array using backside exposure of SU-8 [J]. J. Micromech. Microeng, 2004,14(2):597-603.

    CLP Journals

    [1] DU Li-qun, LI Cheng-bin, LI Yong-hui, YU Tong-min. Application of ultrasonic stress relief technology to microinjection mold fabrication[J]. Optics and Precision Engineering, 2012, 20(6): 1250

    Tools

    Get Citation

    Copy Citation Text

    CHEN Shao-jun, LI Yi-gui, SUGIYAMA Susumu. Microneedle array and mask compensation based on X-ray lithography[J]. Optics and Precision Engineering, 2010, 18(2): 420

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Sep. 21, 2009

    Accepted: --

    Published Online: Aug. 31, 2010

    The Author Email: Shao-jun CHEN (chenshaojun@sjtu.edu.cn)

    DOI:

    CSTR:32186.14.

    Topics