Optics and Precision Engineering, Volume. 18, Issue 2, 420(2010)
Microneedle array and mask compensation based on X-ray lithography
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CHEN Shao-jun, LI Yi-gui, SUGIYAMA Susumu. Microneedle array and mask compensation based on X-ray lithography[J]. Optics and Precision Engineering, 2010, 18(2): 420
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Received: Sep. 21, 2009
Accepted: --
Published Online: Aug. 31, 2010
The Author Email: Shao-jun CHEN (chenshaojun@sjtu.edu.cn)
CSTR:32186.14.
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