[1] C A BREWER, F BRIZUELA, P WACHULAK et al. Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution. Optics Letters, 33, 518-520(2008).

[2] P W WACHULAK, A BARTNIK, H FIEDOROWICZ. Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser-plasma EUV source. Optics Letters, 35, 2337-2339(2010).

[3] P W WACHULAK, A BARTNIK, H FIEDOROWICZ et al. A 50 nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth. Optics Express, 19, 9541-9550(2011).

[4] G VASCHENKO, C BREWER, F BRIZUELA et al. Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light. Optics Letters, 31, 1214-1216(2006).

[5] C WAGNER, N HARNED. Lithography gets extreme. Nature Photonics, 4, 24-26(2010).

[6] C W GWYN. Extreme ultraviolet lithography. Journal of Vacuum Science & Technology B： Microelectronics and Nanometer Structures, 16, 3142(1998).

[7] T ITO, S OKAZAKI. Pushing the limits of lithography. Nature, 406, 1027-1031(2000).

[8] O WOOD, C S KOAY, K PETRILLO et al. Integration of EUV lithography in the fabrication of 22-nm node devices, 7271, 50-59(2009).

[9] J NORDGREN, G BRAY, S CRAMM et al. Soft X-ray emission spectroscopy using monochromatized synchrotron radiation （invited）. Review of Scientific Instruments, 60, 1690-1696(1989).

[10] Z H LOH, M KHALIL, R E CORREA et al. Quantum state-resolved probing of strong-field-ionized xenon atoms using femtosecond high-order harmonic transient absorption spectroscopy. Physical Review Letters, 98, 143601(2007).

[11] E GOULIELMAKIS, Z H LOH, A WIRTH et al. Real-time observation of valence electron motion. Nature, 466, 739-743(2010).

[12] M BAUER. Femtosecond ultraviolet photoelectron spectroscopy of ultra-fast surface processes. Journal of Physics D： Applied Physics, 38, R253-R267(2005).

[13] B WINTER, R WEBER, W WIDDRA et al. Full valence band photoemission from liquid water using EUV synchrotron radiation. The Journal of Physical Chemistry A, 108, 2625-2632(2004).

[14] B WINTER, R WEBER, I V HERTEL et al. Electron binding energies of aqueous alkali and halide ions：   EUV photoelectron spectroscopy of liquid solutions and combined ab initio and molecular dynamics calculations. Journal of the American Chemical Society, 127, 7203-7214(2005).

[15] B N DWIVEDI. EUV spectroscopy as a plasma diagnostic. Space Science Reviews, 65, 289-316(1993).

[16] M H KEY, T W BARBEE, L BDA SILVA et al. New plasma diagnostic possibilities from radiography with x.u.v. lasers. Journal of Quantitative Spectroscopy and Radiative Transfer, 54, 221-226(1995).

[17] S BOWYER, J J DRAKE, S VENNES. Extreme ultraviolet astronomy. Annual Review of Astronomy and Astrophysics, 38, 231-288(2000).

[18] M A BARSTOW, J B HOLBERG. Extreme ultraviolet Astronomy(2003).

[19] E SPILLER. Low-loss reflection coatings using absorbing materials. Applied Physics Letters, 20, 365-367(1972).

[20] S BAJT, D G STEARNS, P A KEARNEY. Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers. Journal of Applied Physics, 90, 1017-1025(2001).

[21] D KUZNETSOV, A YAKSHIN, M STURM et al. High-reflectance La/B-based multilayer mirror for 6.x-nm wavelength, 9588(2015).

[22] N GHAFOOR, F ERIKSSON, A AQUILA et al. Impact of B₄C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrors. Optics Express, 25, 18274-18287(2017).

[23] Q S HUANG, J N FEI, Y LIU et al. High reflectance Cr/V multilayer with B₄C barrier layer for water window wavelength region. Optics Letters, 41, 701-704(2016).

[24] Q S HUANG, Q YI, Z D CAO et al. High reflectance nanoscale V/Sc multilayer for soft X-ray water window region. Scientific Reports, 7, 12929(2017).

[25] D C XU, Q S HUANG, Y W WANG et al. Enhancement of soft X-ray reflectivity and interface stability in nitridated Pd/Y multilayer mirrors. Optics Express, 23, 33018-33026(2015).

[26] H J NI, Q S HUANG, G C LIU et al. Comparative study of Pd/B₄C X-ray multilayer mirrors fabricated by magnetron sputtering with Kr and Ar gas. Materials （Basel， Switzerland）, 13, 4504(2020).

[27] R STUIK, E LOUIS, A E YAKSHIN et al. Peak and integrated reflectivity， wavelength and gamma optimization of Mo/Si， and Mo/Be multilayer， multielement optics for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B： Microelectronics and Nanometer Structures, 17, 2998(1999).

[28] S BAJT. Improved reflectance and stability of Mo-Si multilayers. Optical Engineering, 41, 1797-1804(2002).

[29] S BRAUN, M MOSS et al. Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors. Japanese Journal of Applied Physics, 41, 4074-4081(2002).

[30] [30] 30孙诗壮， 金春水， 喻波， 等. Mo/Si多层膜表面粗糙度相关镀膜工艺的研究［J］. 光学学报， 2020， 40（10）： 196-202. doi: 10.3788/aos202040.1031002SUNSH ZH， JINCH SH， YUB， et al. Research on surface roughness related coating processes of Mo/Si multilayers［J］. Acta Optica Sinica， 2020， 40（10）： 196-202. （in Chinese）. doi: 10.3788/aos202040.1031002

[31] D L WINDT, J A BELLOTTI. Performance， structure， and stability of SiC/Al multilayer films for extreme ultraviolet applications. Applied Optics, 48, 4932-4941(2009).

[32] F DELMOTTE, E MELTCHAKOV, S DE ROSSI et al. Development of multilayer coatings for solar orbiter EUV imaging telescopes, 8862, 64-73(2013).

[33] A ZIANI, F DELMOTTE, C LE PAVEN-THIVET et al. Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging. Thin Solid Films, 552, 62-67(2014).

[34] Y KONDO, T EJIMA, K SAITO et al. High-reflection multilayer for wavelength range of 200-30 nm. Nuclear Instruments and Methods in Physics Research Section A： Accelerators， Spectrometers， Detectors and Associated Equipment, 467/468, 333-336(2001).

[35] H TAKENAKA, S ICHIMARU, T OHCHI et al. Soft-X-ray reflectivity and heat resistance of SiC/Mg multilayer. Journal of Electron Spectroscopy and Related Phenomena, 144/145/146/147, 1047-1049(2005).

[36] R SOUFLI, D L WINDT, J C ROBINSON et al. Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory, 5901, 173-183(2005).

[37] [37] 37朱京涛， 宋竹青， 丁涛， 等. 极紫外Mg/SiC、Mg/Co多层膜的稳定性［J］. 光学 精密工程， 2013， 21（6）： 1380-1386. doi: 10.3788/ope.20132106.1380ZHUJ T， SONGZH Q， DINGT， et al. Stability of Mg/SiC， Mg/Co EUV multilayers［J］. Optics and Precision Engineering， 2013， 21（6）： 1380-1386. （in Chinese）. doi: 10.3788/ope.20132106.1380

[38] A V VINOGRADOV, Y P PERSHIN, E ZUBARYEV et al. Structure， thermal stability， and reflectivity of Sc/Si and Sc/W/Si/W multilayer X-ray mirrors, 4505, 230-235(2001).

[39] A D RAKIĆ. Algorithm for the determination of intrinsic optical constants of metal films： application to aluminum. Applied Optics, 34, 4755-4767(1995).

[40] M VIDAL-DASILVA, M FERNÁNDEZ-PEREA, J A MÉNDEZ et al. Narrowband multilayer coatings for the extreme ultraviolet range of 50-92 nm. Optics Express, 17, 22773-22784(2009).

[41] J C GREEN, K FRANCE. SubLymE： the sub-Lyman alpha explorer, 9144(2014).

[42] N J CUNNINGHAM, E WILKINSON. Holographic telescope design for wide-field imaging of O VI 1032， 1038 A, 5166, 296-306(2004).

[43] [43] 43章敏. 太阳过渡区爆发事件的紫外谱线学研究［D］. 合肥： 中国科学技术大学， 2010.ZHANGM. Ultraviolet Spectroscopic Study on Solar Transition Region Explosive Events［D］. Hefei： University of Science and Technology of China， 2010. （in Chinese）

[44] L BIANCHI, B EFREMOVA, P HODGE et al. A Treasury study of star-forming regions in the local group. i.hstphotometry of young populations in six dwarf galaxies. The Astronomical Journal, 143, 74(2012).

[45] S OSTERMAN, E WILKINSON, J C GREEN et al. Cosmic origins spectrograph FUV grating performance. Proceedings of SPIE-the International Society for Optical Engineering, 4013(2000).

[46] M QUIJADA, S RICE, E MENTZELL. Enhanced MgF₂ and LiF over-coated Al mirrors for FUV space astronomy. Proceedings of SPIE-the International Society for Optical Engineering, 8450(2012).

[47] [47] 47王风丽， 周东伟， 张金帅， 等. 真空紫外Al/MgF2反射镜［J］. 光学 精密工程， 2015， 23（4）： 913-918. doi: 10.3788/OPE.20152304.0913WANGF L， ZHOUD W， ZHANGJ SH， et al. Al/MgF2 mirrors in vacuum ultraviolet region［J］. Opt. Precision Eng.， 2015， 23（4）： 913-918. （in Chinese）. doi: 10.3788/OPE.20152304.0913

[48] L V R DE MARCOS, J I LARRUQUERT, J A MÉNDEZ et al. Optimization of MgF₂-deposition temperature for far UV Al mirrors. Optics Express, 26, 9363-9372(2018).

[49] M ZUKIC, D G TORR. Multiple reflectors as narrow-band and broadband vacuum ultraviolet filters. Applied Optics, 31, 1588-1596(1992).

[50] X D WANG, B CHEN, Y LIU et al. Design and fabrication of narrowband 121.6nm minus filters. Frankfurt, 10691, 166-176(2018).

[51] KORTRIGHT， RICE， CARR, KORTRIGHT， RICE， CARR, KORTRIGHT， RICE， CARR. Soft-x-ray Faraday rotation at Fe L2， 3 edges. Physical Review B, 51, 10240-10243(1995).

[52] J B KORTRIGHT, S K KIM, E E FULLERTON et al. X-ray magneto-optic Kerr effect studies of spring magnet heterostructures. Nuclear Instruments and Methods in Physics Research Section A： Accelerators， Spectrometers， Detectors and Associated Equipment, 467/468, 1396-1403(2001).

[53] [53] 53潘磊. 大面积高均匀性中子多层膜光学元件研究［D］. 上海： 同济大学， 2010.PANL. The Study of Multilayer Neutron Optic Elements with Large area and High Uniformity［D］. Shanghai： Tongji University， 2010. （in Chinese）

[54] S B QADRI, C KIM, M TWIGG et al. Ion-beam deposition of Zr-Al multilayers and their structural properties. Surface and Coatings Technology, 54/55, 335-337(1992).

[55] K BLOBAUM, T WEIHS, T BARBEE et al. Solid state reaction of Al and Zr in Al/Zr multilayers： a calorimetry study. MRS Proceedings, 382, 27(1995).

[56] D L VORONOV, E H ANDERSON, R CAMBIE et al. A 10， 000 groove/mm multilayer coated grating for EUV spectroscopy. Optics Express, 19, 6320-6325(2011).

[57] Q ZHONG, Z ZHANG, J T ZHU et al. The chemical characterization and reflectivity of the Al（1.0%wtSi）/Zr periodic multilayer. Applied Surface Science, 259, 371-375(2012).

[58] Q ZHONG, Z ZHANG, J T ZHU et al. The thermal stability of Al（1%wtSi）/Zr EUV mirrors. Applied Physics A, 109, 133-138(2012).

[59] R SOUFLI, M FERNÁNDEZ-PEREA, S L BAKER et al. Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings. Applied Physics Letters, 101(2012).

[60] [60] 60朱京涛， 黄秋实， 白亮， 等. 不同本底真空度下SiC/Mg极紫外多层膜的制备和测试［J］. 光学 精密工程， 2009， 17（12）： 2946-2951. doi: 10.3321/j.issn:1004-924X.2009.12.011ZHUJ T， HUANGQ SH， BAIL， et al. Manufacture and measurement of SiC/Mg EUV multilayer mirrors in different base pressures［J］. Opt. Precision Eng.， 2009， 17（12）： 2946-2951. （in Chinese）. doi: 10.3321/j.issn:1004-924X.2009.12.011

[61] H C LI, J T ZHU, Z S WANG et al. Asymmetrical diffusion at interfaces of Mg/SiC multilayers. Optical Materials Express, 3, 546-555(2013).

[62] [62] 62李浩川. Mg基多层膜光学性能、界面结构及热稳定性研究［D］. 上海： 同济大学， 2013.LIH CH. Study on Optical Properties， Interface Structure and Thermal Stability of Mg-based Multilayer Films［D］. Shanghai： Tongji University， 2013. （in Chinese）

[63] H C LI, S K ZHOU, X Q WANG et al. Improved thermal stability of Mg/Co multilayer by introducing Zr barrier layer, 8501(2012).

[64] H C LI, J T ZHU, S K ZHOU et al. Zr/Mg multilayer mirror for extreme ultraviolet application and its thermal stability. Applied Physics Letters, 102, 111103(2013).

[65] J J ROCCA, M FRATI, B BENWARE et al. Capillary discharge tabletop soft X-ray lasers reach new wavelengths and applications. Comptes Rendus De l'Académie Des Sciences-Series IV-Physics, 1, 1065-1081(2000).

[66] J F SEELY, Y A USPENSKII, Y P PERSHIN et al. Skylab 3600 groove/mm replica grating with a scandium-silicon multilayer coating and high normal-incidence efficiency at 38-nm wavelength. Applied Optics, 41, 1846-1851(2002).

[67] Y C LIM, T WESTERWALBESLOH, A ASCHENTRUP et al. Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. Applied Physics A, 72, 121-124(2001).

[68] Y A USPENSKII, V E LEVASHOV, A V VINOGRADOV et al. High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35-50 nm. Optics Letters, 23, 771-773(1998).

[69] H TIAN, E MARSCH, W CURDT et al. Upflows in funnel-like legs of coronal magnetic loops. Astrophysical Journal, 704, 883-890(2009).

[70] K WILHELM, I E DAMMASCH, E MARSCH et al. On the source regions of the fast solar windinpolar coronal holes. Astronomy and Astrophysics, 353, 749-756(2000).

[71] T AIOUAZ, H PETER, P LEMAIRE. The correlation between coronal Doppler shifts and the supergranular network. Astronomy & Astrophysics, 435, 713-721(2005).

[72] M VIDAL-DASILVA, M FERNANDEZ-PEREA, J I LARRUQUERT et al. Narrowband multilayer mirrors for the extreme ultraviolet spectral range of 50 to 95 nm, 7448, 143-152(2009).

[73] J I LARRUQUERT, M VIDAL-DASILVA, S GARCíA-CORTéS et al. Multilayer coatings for the far and extreme ultraviolet, 8076, 129-136(2011).

[74] [74] 74肖两省， 齐润泽， 来搏， 等. 不同本底真空制备的Yb/Al多层膜结构和反射率研究［J］. 光子学报， 2021， 50（11）： 279-286.XIAOL SH， QIR Z， LAIB， et al. Study on the structure and reflectivity of Yb/Al multilayers prepared by different base pressure［J］. Acta Photonica Sinica， 2021， 50（11）： 279-286. （in Chinese）

[75] M FERNÁNDEZ-PEREA, J I LARRUQUERT, J A AZNÁREZ et al. Vacuum ultraviolet coatings of Al protected with MgF₂ prepared both by ion-beam sputtering and by evaporation. Applied Optics, 46, 4871-4878(2007).

[76] G HASS, R TOUSEY. Reflecting coatings for the extreme ultraviolet. Journal of the Optical Society of America, 49, 593-602(1959).

[77] A P BRADFORD, G HASS, J F OSANTOWSKI et al. Preparation of mirror coatings for the vacuum ultraviolet in a 2-m evaporator. Applied Optics, 8, 1183-1189(1969).

[78] F L WANG, S Y LI, Z Z ZHANG et al. Effect of MgF₂ deposition temperature on Al mirrors in vacuum ultraviolet, 11064, 110640O(2019).

[79] L R CANFIELD, G HASS, J E WAYLONIS. Further studies on MgF₂-overcoated aluminum mirrors with highest reflectance in the vacuum ultraviolet. Applied Optics, 5, 45-50(1966).

[80] S WILBRANDT, O STENZEL, H NAKAMURA et al. Protected and enhanced aluminum mirrors for the VUV. Applied Optics, 53, A125-A130(2014).

[81] C M OLIVEIRA, K RETHERFORD, S J CONARD et al. Aging studies of LiF-coated optics for use in the far ultraviolet, 3765, 52-60(1999).

[82] J T BUENO, J ŠTĚPÁN, L BELLUZZI. The lyα lines of h i and he ii： a differential hanle effect for exploring the magnetism of the solar transition region. The Astrophysical Journal Letters, 746, 812-819(2012).

[83] T HAGA, Y UTSUMI, S I ITABASHI. Soft X-ray ellipsometer using transmission multilayer polarizers, 3443, 117-127(1998).

[84] S D FONZO, W JARK, F SCHÄFERS et al. Phase-retardation and full-polarization analysis of soft-x-ray synchrotron radiation close to the carbon K edge by use of a multilayer transmission filter. Applied Optics, 33, 2624-2632(1994).

[85] H C WANG, Z S WANG, Z X GU et al. Design of soft X-ray multilayer polarizing elements, 6034, 310-316(2006).

[86] Z S WANG, H C WANG, J T ZHU et al. Complete polarization analysis of extreme ultraviolet radiation with a broadband phase retarder and analyzer. Applied Physics Letters, 90(2007).

[87] Z S WANG, H C WANG, J T ZHU et al. Broadband Mo/Si multilayer transmission phase retarders for the extreme ultraviolet. Applied Physics Letters, 90, 31901(2007).

[88] Z S WANG, H C WANG, J T ZHU et al. Extreme ultraviolet broadband Mo∕Y multilayer analyzers. Applied Physics Letters, 89, 241120(2006).

[89] Z S WANG, H C WANG, J T ZHU et al. Broad angular multilayer analyzer for soft X-rays. Optics Express, 14, 2533-2538(2006).

[90] [90] 90王洪昌. 极紫外与软X射线多层膜偏振元件研究［D］. 上海： 同济大学， 2007.WANGH CH. The Research of Multilayer Polarizing Components in Extreme Ultraviolet and Soft X-Ray［D］. Shanghai： Tongji University， 2007. （in Chinese）