Optics and Precision Engineering, Volume. 22, Issue 8, 2142(2014)

Design and testing of deflecting mirror system of X-ray interference lithography beamline

GONG Xue-peng*... LU Qi-peng and PENG Zhong-qi |Show fewer author(s)
Author Affiliations
  • [in Chinese]
  • show less
    References(15)

    [1] [1] SCHATTENBURG M L,AUCOIN R J,FLEMING R C,et al.. Fabrication of high-energy X-ray transmission gratings for the Advanced X-ray Astrophysics Facility (AXAF)[J]. SPIE, 1994, 2280: 181-190.

    [2] [2] GEORGE R B. Electron-Beam Technology in Microelectronics Fabrication[M].Newyork:Academic Press,1980:11-16.

    [3] [3] HIRSCHER S,KMMEL M,KIRCH O, et al.. Ion projection lithography below 70 nm: tool performance and resist process [J]. Microelectronic Engineering. 2002, 61-62: 301-307.

    [4] [4] RESNICK D J,DAUKSHER W J. Imprint lithography: lab curiosity or the real NGL[J]. SPIE Microlithography Conference, 2003, 12-23.

    [5] [5] HEYDERMAN L J, SOLAK H H,DAVID C, et al.. Arrays of nanoscale magnetic dots: Fabrication by x-ray interference lithography and characterization [J]. Appl.Phys.Lett., 2004, 85: 4989-4991.

    [6] [6] YASIN E, HARUN H S, CHRISTIAN D, et al.. Bilayer Al wire-grids as broadband and high performance polarizers[J]. Optics Express, 2006,14(6): 2323-2334.

    [7] [7] SOLAK H,DAVID C,GOBRECHT J, et al.. Fabrication of high-resolution zone plates with wideband extreme-ultraviolet holography[J]. Appl. Phys. Lett., 2004, 85(14): 2700-2702.

    [8] [8] HARUN H S, YASIN E, PHILIPP K. Photon-beam lithography reaches 12.5 nm half-pitch resolution [J]. J. Vac. Sci. Technol. B. 2007,25: 91-95.

    [9] [9] TEIXEIRA A I,ABRAMS G A,MURPHY C J, et al.. Cell behavior on lithographically defined nanostructured substrates[J]. J. Vac. Sci. Tech. B, 2003, 21(2): 683-68.

    [13] [13] GONG X P, LU Q P, PENG Z Q. Structure design and accuracy testing of monochromator in a soft X-ray spectromicroscopic beamline [J]. Acta Optica Sinica, 2013,33(2):0234001.(in Chinese)

    Tools

    Get Citation

    Copy Citation Text

    GONG Xue-peng, LU Qi-peng, PENG Zhong-qi. Design and testing of deflecting mirror system of X-ray interference lithography beamline[J]. Optics and Precision Engineering, 2014, 22(8): 2142

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Nov. 12, 2013

    Accepted: --

    Published Online: Sep. 15, 2014

    The Author Email: Xue-peng GONG (gongxuepeng120@foxmail.com)

    DOI:10.3788/ope.20142208.2142

    Topics