Laser & Optoelectronics Progress, Volume. 56, Issue 19, 192501(2019)

Design of 10-kV Vertical Double-Diffused Insulted-Gate Photoconductive Semiconductor Switch

Xinmei Wang1、*, Huihui Wang2, Lini Zhang2, Pengchong Duan2, and Wanli Jia2
Author Affiliations
  • 1Faculty of Automation and Information Engineering, Xi'an University of Technology, Xi'an, Shaanxi 710048, China
  • 2Faculty of Sciences, Xi'an University of Technology, Xi'an, Shaanxi 710048, China
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    References(22)

    [7] Ehrentraut D, Meissner E, Bockowski M. Technology of gallium nitride crystal growth[M]. Berlin: Springer, 56-59(2010).

    [15] Liu E K[M]. Semiconductor physics, 168-169(2011).

    [18] Pearton S J, Abernathy C R, Ren F. Gallium nitride processing for electronics, sensors and spintronics[M]. London: Springer(2006).

    [19] Skorupa W, Schmidt H. Subsecond annealing of advanced materials[M]. Cham: Springer(2014).

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    Xinmei Wang, Huihui Wang, Lini Zhang, Pengchong Duan, Wanli Jia. Design of 10-kV Vertical Double-Diffused Insulted-Gate Photoconductive Semiconductor Switch[J]. Laser & Optoelectronics Progress, 2019, 56(19): 192501

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    Paper Information

    Category: OPTOELECTRONICS

    Received: Mar. 8, 2019

    Accepted: Apr. 16, 2019

    Published Online: Oct. 23, 2019

    The Author Email: Wang Xinmei (wangxinmei@xaut.edu.cn)

    DOI:10.3788/LOP56.192501

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