Infrared and Laser Engineering, Volume. 48, Issue 1, 105002(2019)

915 nm semiconductor laser new type facet passivation technology

Wang Xin1,2, Zhu Lingni1, Zhao Yihao1, Kong Jinxia1, Wang Cuiluan1, Xiong Cong1, Ma Xiaoyu1, and Liu Suping1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(17)

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    [4] [4] Li Zaijin, Hu Liming, Wang Ye, et al. Fabrication of 808 nm Al-containing semiconductor laser diode high damage threshold facet coating[J]. Infrared and Laser Engineering, 2010, 39(6): 1034-1037. (in Chinese)

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    [12] [12] Christofer S, Yangting S, Peter B, et al. Nitride facet passivation raises reliability, COMD and enables high temperature operation of InGaAsP, InGaAs and InAlGaAs lasers[C]//SPIE, 2005, 5711: 189-200.

    [13] [13] Brennan B, Milojevic M, Hinkle C L, et al. Optimisation of the ammonium sulphide (NH4)2S passivation process on In0.53Ga0.47As[J]. Applied Surface Science, 2011, 257: 4082-4090.

    [14] [14] Chand N, Hobson W S, De Jong J F. ZnSe for mirror passiwation of high power GaAs based lasers[J]. Electronics Letter, 1996, 32(17): 1595-1596.

    [15] [15] Ziegler M, Tomm W, Elsaesser T. Imaging catastrophic optical mirror damage in high-power diode lasers[J]. Journal of Electronic Materials, 2010, 39(6): 709-714.

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    Wang Xin, Zhu Lingni, Zhao Yihao, Kong Jinxia, Wang Cuiluan, Xiong Cong, Ma Xiaoyu, Liu Suping. 915 nm semiconductor laser new type facet passivation technology[J]. Infrared and Laser Engineering, 2019, 48(1): 105002

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    Paper Information

    Category: 激光器技术

    Received: Aug. 11, 2018

    Accepted: Sep. 14, 2018

    Published Online: Apr. 2, 2019

    The Author Email:

    DOI:10.3788/irla201948.0105002

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