Infrared and Laser Engineering, Volume. 48, Issue 1, 105002(2019)

915 nm semiconductor laser new type facet passivation technology

Wang Xin1...2, Zhu Lingni1, Zhao Yihao1, Kong Jinxia1, Wang Cuiluan1, Xiong Cong1, Ma Xiaoyu1 and Liu Suping1 |Show fewer author(s)
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    Wang Xin, Zhu Lingni, Zhao Yihao, Kong Jinxia, Wang Cuiluan, Xiong Cong, Ma Xiaoyu, Liu Suping. 915 nm semiconductor laser new type facet passivation technology[J]. Infrared and Laser Engineering, 2019, 48(1): 105002

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    Paper Information

    Category: 激光器技术

    Received: Aug. 11, 2018

    Accepted: Sep. 14, 2018

    Published Online: Apr. 2, 2019

    The Author Email:

    DOI:10.3788/irla201948.0105002

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