[1] [1] BRITTEN J, MOLANDER W A, KOMASHKO A M, et al.. Multilayer dielectric gratings for petawatt-class laser systems［J］. SPIE, 2004, 5273: 1-7.

[2] [2] CASTENMILLER T, van de MAST F, de KORT T, et al.. Towards ultimate optical lithography with NXT:1950i dual stage immersion platform［J］.SPIE, 2010, 7640:76401N.

[3] [3] SHIBAZAKI Y, KOHNO H, HAMATANI M, et al.. An innovative platform for high-throughput high-accuracy lithography using a single wafer stage［J］.SPIE, 2009, 7274: 72741I.

[4] [4] WANG L J, ZHANG M, ZHU Y, et al.. A novel heterodyne planar grating encoder system for in-plane and out-of-plane displacement measurement with nanometer-resolution［C］. Proceedings of the 29th annual meeting of the American Society for Precision Engineering, ASPE, 2014: 173-177.

[5] [5] KONKOLA P T. Design and Analysis of a Scanning Beam Interference Lithography System for Patterning Gratings with Nanometer-level Distortions［D］. Cambridge: Massachusetts Institute of Technology, 2003.

[6] [6] SONG Y. Research on the Interference Fringe Static and Dynamic Phase-locking Technology in the Lithography System of the Holographic Grating［D］. Changchun: Changchun Institute of Optics, Fine Mehcanics and Physics, Chinese Academy of Sciences, 2014. (in Chinese)

[7] [7] JITSUNO T, MOTOKOSHI S, OKAMOTO T, et al.. Development of 91 cm size gratings and mirrors for LEFX laser system［J］. Journal of Physics: Conference Series, 2008, 112(3): 032002.

[8] [8] HOLZAPFEL W. Advancements in displacement metrology based on encoder systems［C］. Proceedings of the 23th annual meeting of the American Society for Precision Engineering, ASPE, 2008: 71-74.

[9] [9] WANG L J, ZHANG M, ZHU Y, et al.. Progress on scanning beam interference lithography tool with high environmental robustness for patterning large size grating with nanometre accuracy［C］. Proceedings of the 17th Annual Meeting of the European Society for Precision Engineering and Nanotechnology, EUSPEN, 2017: 173-177.

[10] [10] ZHU Y, WANG L J, ZHANG M, et al.. Novel homodyne frequency-shifting interference pattern locking system［J］. Chinese Optics Letters, 2016, 14(6): 061201.

[11] [11] WANG L J, ZHANG M, ZHU Y, et al.. Ultra-precision control of homodyne frequency-shifting interference pattern phase locking system［J］. Opt. Precision Eng., 2017, 25(5): 1213-1221. (in Chinese)

[12] [12] LEE J Y, CHENA H Y, HSUB C C, et al.. Optical heterodyne grating interferometry for displacement measurement with subnanometric resolution［J］. Sensors and Actuators A: Physical, 2007, 137(1): 185-191.

[13] [13] GUAN J, KOCHERT P, WEICHERT C, et al.. A high performance one-dimensional homodyne encoder and the proof of principle of a novel two-dimensional homodyne encoder［J］. Precision Engineering, 2013, 37(4): 865-870.

[14] [14] CHENG F, FAN K CH. Linear diffraction grating interferometer with high alignment tolerance and high accuracy［J］. Applied Optics, 2012, 50(22): 4550-4556.

[15] [15] KAO C F, LU S H, SHEN H M, et al.. Diffractive laser encoder with a grating in Littrow configuration［J］. Japanese Journal of Applied Physics, 2008, 47(3): 1833-1837.

[16] [16] KAO C F, CHANG C C, LU M H. Double-diffraction planar encoder by conjugate optics［J］. Optical Engineering, 2005, 44(2): 023603.

[17] [17] HSU C C, WU C C, LEE J Y, et al.. Reflection type heterodyne grating interferometry for in-plane displacement measurement［J］. Optics Communications, 2008, 281(9): 2582-2589.

[18] [18] LEE C K, WU C C, CHEN S J, et al.. Design and construction of linear laser encoders that possess high tolerance of mechanical runout［J］. Applied Optics, 2004, 43(31): 5754-5762.

[19] [19] WU C C, HSU C C, LEE J Y, et al.. Optical heterodyne laser encoder with sub-nanometer resolution［J］. Measurement Science and Technology, 2008, 19(4): 045305.

[20] [20] WU C C, CHENG CH Y, YANG Z Y. Optical homodyne common-path grating interferometer with sub-nanometer displacement resolution［J］. SPIE, 2010, 7791: 779105.

[21] [21] HSIEH H L, LEE J Y, WU W T, et al.. Quasi-common-optical-path heterodyne grating interferometer for displacement measurement［J］. Measurement Science and Technology, 2010, 21(11): 115304.

[22] [22] SHANG P. Study on the Key Technology of High-resolution Diffraction Grating Interferometric Transducer of Linear Displacements［D］. Hefei: Hefei University of Technology, 2005. (in Chinese)

[23] [23] DEMAREST F C. High-resolution, high-speed, low data age uncertainty, heterodyne displacement measuring interferometer electronics［J］. Measurement Science and Technology, 1998, 9(7): 1024-1030.

[24] [24] BIRCH K P, DOWNS M J. Correction to the updated Edlén equation for the refractive index of air［J］. Metrologia, 1994, 31(4): 315-316.

[25] [25] BIRCH K P, DOWNS M J. An updated Edlén equation for the refractive index of air［J］. Metrologia, 1993, 30(3): 155-162.

[26] [26] JIN Q F. Study on the Affecting Factors of Atmospheric Refractive Index［D］. Hangzhou: Zhejiang University, 2006. (in Chinese)