Development of Extreme Ultraviolet Photoresists

Xudong Guo; Guoqiang Yang; Yi Li

doi:10.3788/LOP202259.0922004

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922004(2022)

Development of Extreme Ultraviolet Photoresists

Xudong Guo^1,3、†, Guoqiang Yang^1,3、†,*, and Yi Li^2,3

¹Key Laboratory of Photochemistry, Chinese Academy of Sciences, Beijing National Laboratory for Molecular Sciences, Beijing 100190, China

²Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

³University of Chinese Academy of Sciences, Beijing 100039, China

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Xudong Guo, Guoqiang Yang, Yi Li. Development of Extreme Ultraviolet Photoresists[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922004

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Paper Information

Category: Optical Design and Fabrication

Received: Oct. 22, 2021

Accepted: Nov. 22, 2021

Published Online: May. 6, 2022

The Author Email: Yang Guoqiang (gqyang@iccas.ac.cn)

DOI:10.3788/LOP202259.0922004

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology