Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm

Xiaoxiao WEI; Zhenlei WANG; Jiaxin WANG; Zhenqiu DAI

doi:10.3969/j.issn.1005-5630.202311140125

Optical Instruments, Volume. 46, Issue 6, 42(2024)

Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm

Xiaoxiao WEI*... Zhenlei WANG, Jiaxin WANG and Zhenqiu DAI |Show fewer author(s)

Author Affiliations

School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

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Figures & Tables(7)

Fig. 1. Schematic diagram of instantaneous photoelastic method of circular off-field over depth of field

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Fig. 2. Experimental results of ultra-depth field algorithm

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Fig. 3. Equipment structure diagram

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Fig. 4. Single field ultra depth of field diagram（left）Splicing path diagram（right）

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Fig. 5. Splicing schematic

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Fig. 6. Stress values under different focusing states

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Table 1. Comparison of stress images
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Table 1. Comparison of stress images
高度/mm 6 inch晶圆局部对比1 局部对比2
0
4
8
12
16
20
24
28
景深合成

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Xiaoxiao WEI, Zhenlei WANG, Jiaxin WANG, Zhenqiu DAI. Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm[J]. Optical Instruments, 2024, 46(6): 42

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