Journal of Semiconductors, Volume. 45, Issue 2, 022501(2024)

Controllable step-flow growth of GaN on patterned freestanding substrate

Peng Wu1,2,3,4, Jianping Liu1、*, Lei Hu1, Xiaoyu Ren1, Aiqin Tian1, Wei Zhou1, Fan Zhang1,2, Xuan Li1, Masao Ikeda1, and Hui Yang1,2、**
Author Affiliations
  • 1Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
  • 2School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
  • 3Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China
  • 4University of Chinese Academy of Sciences, Beijing 100049, China
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    Peng Wu, Jianping Liu, Lei Hu, Xiaoyu Ren, Aiqin Tian, Wei Zhou, Fan Zhang, Xuan Li, Masao Ikeda, Hui Yang. Controllable step-flow growth of GaN on patterned freestanding substrate[J]. Journal of Semiconductors, 2024, 45(2): 022501

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    Paper Information

    Category: Articles

    Received: Aug. 17, 2023

    Accepted: --

    Published Online: Apr. 24, 2024

    The Author Email: Liu Jianping (JPLiu), Yang Hui (HYang)

    DOI:10.1088/1674-4926/45/2/022501

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