Optics and Precision Engineering, Volume. 31, Issue 18, 2627(2023)
Effect of magnetic field and target-substrate distance on properties of CrAlN films
Figures & Tables(8)
Fig. 1. Schematic diagram of cathodic arc sputtering deposition equipment and deposition principle
Fig. 2. SEM and AFM cross-section and surface topography of CrAlN films with a magnetic field
Fig. 3. SEM and AFM cross-section and surface topography of CrAlN films without a magnetic field
Fig. 5. Variation curve of film substrate binding force and curvature radius of T10 steel test sheet
Fig. 6. Variation curve of friction coefficient and friction life of thin film measured by Ball-on-disk method
Fig. 7. Wear cross-section curve of without magnetic and with magnetic samples
Table 1. Technical parameters of CrAlN preparation
View tableView in ArticleTable 1. Technical parameters of CrAlN preparation
Sample Target-substrate distance /mm Film structure and deposition parameters With a magnetic field Without a
magnetic field
1# 1* 120 1. Binding layer-Cr film： Target current 90 A， Ar traffic 400 sccm， Bias voltage 800 V
2. Transition layer-CrN film： Target current 100 A， N2 traffic 300 sccm， Bias voltage 500 V
3. Gradient layer-CrAlN film： Target current 100 A， N2 traffic 400 sccm， Bias voltage 300 V
4. Wear-resistant layer-CrAlN film： Target current 120 A， N2 traffic 600 sccm， Bias voltage 120 V
2# 2* 140 3# 3* 160 4# 4* 180 5# 5* 200
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Jinhua ZHENG, Shiyang MEI, Zhixiong LI, Qingyun LIU. Effect of magnetic field and target-substrate distance on properties of CrAlN films[J]. Optics and Precision Engineering, 2023, 31(18): 2627
Paper Information
Category: Modern Applied Optics
Received: Apr. 12, 2023
Accepted: --
Published Online: Oct. 12, 2023
The Author Email: LI Zhixiong (lzxiong314@163.com)
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