Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu; Yanqiu Li

doi:10.3788/AOS202040.0522001

Acta Optica Sinica, Volume. 40, Issue 5, 0522001(2020)

Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu and Yanqiu Li^*

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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Mo Liu, Yanqiu Li. Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System[J]. Acta Optica Sinica, 2020, 40(5): 0522001

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Paper Information

Category: Optical Design and Fabrication

Received: Sep. 19, 2019

Accepted: Nov. 26, 2019

Published Online: Mar. 10, 2020

The Author Email: Li Yanqiu (liyanqiu@bit.edu.cn)

DOI:10.3788/AOS202040.0522001

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