Semiconductor Optoelectronics, Volume. 44, Issue 1, 81(2023)

Simulation of Precursor Distribution in Chamber During Atomic Layer Deposition

LEI Xinghang... WANG Guozheng* and YANG Jikai |Show fewer author(s)
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    References(15)

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    LEI Xinghang, WANG Guozheng, YANG Jikai. Simulation of Precursor Distribution in Chamber During Atomic Layer Deposition[J]. Semiconductor Optoelectronics, 2023, 44(1): 81

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    Paper Information

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    Received: Nov. 7, 2022

    Accepted: --

    Published Online: Apr. 7, 2023

    The Author Email: Guozheng WANG (Wguozheng@163.com)

    DOI:10.16818/j.issn1001-5868.2022110702

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