Semiconductor Optoelectronics, Volume. 44, Issue 1, 81(2023)
Simulation of Precursor Distribution in Chamber During Atomic Layer Deposition
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LEI Xinghang, WANG Guozheng, YANG Jikai. Simulation of Precursor Distribution in Chamber During Atomic Layer Deposition[J]. Semiconductor Optoelectronics, 2023, 44(1): 81
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Received: Nov. 7, 2022
Accepted: --
Published Online: Apr. 7, 2023
The Author Email: Guozheng WANG (Wguozheng@163.com)
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