Journal of Semiconductors, Volume. 45, Issue 4, 042701(2024)

Hybrid bonding of GaAs and Si wafers at low temperature by Ar plasma activation

Rui Huang1、*, Zhiyong Wang2, Kai Wu1, Hao Xu1, Qing Wang1, and Yecai Guo1
Author Affiliations
  • 1School of Electronic and Information Engineering, Wuxi University, Wuxi 214105, China
  • 2Institute of Advanced Technology on Semiconductor Optics & Electronics, Institute of Laser Engineering, Beijing University of Technology, Beijing 100124, China
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    References(19)

    [19] G R He, G H Yang, W H Zheng et al. Analysis of Si/GaAs Bonding Stresses with the Finite Element Method. J Semicond, 27, 11(2006).

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    Rui Huang, Zhiyong Wang, Kai Wu, Hao Xu, Qing Wang, Yecai Guo. Hybrid bonding of GaAs and Si wafers at low temperature by Ar plasma activation[J]. Journal of Semiconductors, 2024, 45(4): 042701

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    Paper Information

    Category: Articles

    Received: Sep. 29, 2023

    Accepted: --

    Published Online: Jun. 21, 2024

    The Author Email: Huang Rui (RHuang)

    DOI:10.1088/1674-4926/45/4/042701

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