[1] [1] WU J F, LU ZH W, ZHANG H X, et al.. Processing model and controlling error of Ion beam processing based on the optical aspheric surface ［J］. Opt. Precision Eng., 2009, 17(11): 2678-2683.(in Chinese)

[2] [2] LIU H, LU ZH W, XIONG ZH, et al.. Exposure system of Absolute type grating ruler ［J］. Opt. Precision Eng., 2014, 22(7): 1814-1819.(in Chinese)

[3] [3] YU W X, LU ZH W, WANG P, et al.. Comparison of periodic subwavelength structure and multilayer antireflection coatings ［J］. Opt. Precision Eng., 2004, 9(1): 10-13.(in Chinese)

[4] [4] LIU M ZH, LU H, XU W B, et al.. Membrane photon sieve for the space telescope ［J］. Opt. Precision Eng., 2014(08): 2127-2134.(in Chinese)

[5] [5] CAO ZH L, LU ZH W, LI F Y, et al.. design and analysis of the two-dimensional antireflective subwavelength grating structures ［J］. Opt. Precision Eng., 2014, 10(06): 537-51.(in Chinese)

[6] [6] CARCANO G, CERIANI M, SOGLIO F. Spin coating with high viscosity photoresist on square substrates ［J］. Microelectronics International, 2013, 10(3): 12-20.

[7] [7] BORNSIDE D E, MACOSKO C W, SCRIVEN L E. On the modelling of spin coating ［J］. Journal of Imaging Science and Technology, 1984, 13: 122-130.

[8] [8] MEYERHOFER D. Characteristics of resist films produced by spinning ［J］. Journal of Applied Physics, 1978, 49: 3993-3997.

[9] [9] BORNSIDE D E, MACOSKO C W, SCRIVEN L E. Spin coating: one-dimensional model ［J］. Journal of Applied Physics, 1989, 66: 5185-5193.

[10] [10] HAALAND P, MCKIBBEN J, PARADI M. Fundamental constraints on thin film coatings for flat-panel display manufacturing ［J］. S/D, 1995: 79-84.

[11] [11] BRITTEN J A, THOMAS I M. Non-newtonian flow effects during spin coaling large-area optical coatings with colloidal suspensions ［J］. Journal of Applied Physics, 1992, 71: 972-979.

[12] [12] BOKH F, BIRBARA P J. Method of meniscus coating ［P］. U.S. Patent, 4370356, 1983.

[13] [13] BHATTACHARYA S K, BHATEVARA S, MORALSE H, et al.. Low-cost, high throughput, large area meniscus coating for MCM-D and MCM-L substrates ［J］. International Symposium on Microelectronics, 2000, 4339: 74-79.

[14] [14] JAEHOON K, BRIAN J N, JOSEPH M D, et al.. Ultrathin film deposition by liquid CO2 free meniscus coating-uniformity and morphology［J］. Langmuir, 2006, 22: 642-657.

[15] [15] BHATTACHARYA S K, MOON K S, TUMMALA R R, et al.. Meniscus coating: a low-cost polymer deposition method for system-on-package(SOP) substrates ［J］. IEEE Transactions on Electronics Packaging Manufacturing, 2003, 26: 110-114.

[16] [16] HERRICK C S. Method and apparatus for meniscus coating ［P］. U.S. Patent 3201275, 1965.

[17] [17] BOK H F, BIRBARA P J. Uniform, micro-thin ［P］. U.S. Patent 4370356, 1983.

[18] [18] GAUSS A F, KAMEN E W, CHNG C M, et al.. Recipe generation for large-area meniscus coating using kalman filter estimation ［J］. IEEE Electronics Manufacturing Technology Symposium, 1997, 97: 76-80.

[19] [19] BHATEVARA S, BHATTACHARYA S K, MAY G S, et al.. Mechatronics toward development of a fully automated meniscus coating system［J］. 54th Electronic Components & Technology Conference, 2004, 1: 2009-2014.

[20] [20] BHATTACHARYA S K, BHATEVARA S, SUTTER D A, et al.. An automated work cell for meniscus coating on 24-in packaging substrates ［J］. IEEE Transactions on Components And Packaging Technologies, 2001, 24: 625-630.

[21] [21] BRITTEN J A, THOMAS I M. Sol-gel multilayers applied by a meniscus coating process ［J］. Better Ceramics Through Chemistry V, 1992: 271, 413.

[22] [22] BHATTACHARYA S K, BHATEVARA S, MORALES H, et al.. An automated meniscus coating system for polymer deposition on large-area MCM-D and MCM-L substrates ［J］. IEEE Transactions on Electronics Packaging Manufacturing, 2000, 23: 267-276.

[23] [23] SAVAGE M. Meniscus roll coating: Steady flows and instabilities ［J］. Free Boundary Problems: Theory And Applications, 1999, 409: 89-102.

[24] [24] JERALD A, BRITTEN J A. A Simple theory for the entrained film thickness during meniscus coating ［ zJ］. Nuclear Physics A, 1969, 123: 33-53.

[25] [25] GARROU P, REHG T, HEISTAND R, et al.. Large area processing: Meniscus coating of thin film polymer dielectric & photoresist ［J］. Proceedings of International Symposium on Microelectronics, 1997, 3235: 150-156.