[1] Xia J J, Yu J, Wang Z S et al. Scratch evolution for monocrystalline silicon during chemical-mechanical polishing[J]. Acta Optica Sinica, 42, 0912002(2022).

[2] Sun G B, Jiang S L, Zhang Y H et al. Ion beam polishing process of off-axis parabolic mirror[J]. Acta Optica Sinica, 42, 0922003(2022).

[3] Wang Z Z, Shi C C, Zhang P F et al. Recent progress of advanced optical manufacturing technology[J]. Journal of Mechanical Engineering, 57, 23-56(2021).

[4] Chen B W, Sun S F, Wang X et al. Research progress of laser polishing technology for material surface[J]. China Surface Engineering, 34, 74-89(2021).

[5] Li Q, Liu Q L, Du Y J et al. Advances in optimization design and application of textured surfaces[J]. China Surface Engineering, 34, 59-73(2021).

[6] Lin Z W, Wang Z Z, Huang X P et al. Influence of robotic structural deformation on bonnet polishing removal function[J]. High Power Laser and Particle Beams, 33, 24-32(2021).

[7] Cao M C, Zhao H Y, Xie R Q et al. Multiparameter optimization design of chemical mechanical polishing for planar optics[J]. The International Journal of Advanced Manufacturing Technology, 113, 2153-2162(2021).

[8] Liao D F, Zhang F H, Xie R Q et al. Deterministic control of material removal distribution to converge surface figure in full-aperture polishing[J]. Journal of Manufacturing Processes, 53, 144-152(2020).

[9] He M Z, Wang L, Zhou P F et al. Technique of double-sided polishing based on ring-pendulum polishing[J]. Infrared and Laser Engineering, 40, 1526-1529(2011).

[10] He M Z, Wang L, Zhou P F et al. Double-side polishing of 3 mm large-aperture ultra-thin component[J]. High Power Laser and Particle Beams, 25, 3315-3317(2013).

[11] He M Z, Zhou P F, Huang Y. Research on non-fixed ring belt double-side polishing technology[J]. High Power Laser and Particle Beams, 30, 38-42(2018).

[12] Zhang Y, Huang Y G, Liu H et al. Material removal property in double-sided polishing process for microchannel plates[J]. Infrared Technology, 36, 336-342(2014).

[13] Zhao D W, Wang T Q, He Y Y et al. Kinematic optimization for chemical mechanical polishing based on statistical analysis of particle trajectories[J]. IEEE Transactions on Semiconductor Manufacturing, 26, 556-563(2013).

[14] Huang T, Zhao D, Cao Z C. Trajectory planning of optical polishing based on optimized implementation of dwell time[J]. Precision Engineering, 62, 223-231(2020).

[15] Yang J S, Zhu X L. Research on uniformity of trajectory in planetary double-side lapping process[J]. Mechanical Research & Application, 28, 41-43(2015).

[16] Ji M T. Study on uniformity of particle trajectories with irrational rotational ratio in lapping and polishing[D](2016).

[17] Zhong M, Yuan R J, Li X B et al. Effects of abrasive particles and pads' characteristics on ultrasonic assisted chemical mechanical polishing for sapphire[J]. China Surface Engineering, 31, 125-132(2018).