Influence of annealing temperature on the performance of Ge film and photon-counting imaging system

Feifei Zhao; Baosheng Zhao; Xiaofeng Sai; Xinghua Zhang; Yonglin Wei; Wei Zou

doi:10.3788/COL20100804.0361

Chinese Optics Letters, Volume. 8, Issue 4, 361(2010)

Influence of annealing temperature on the performance of Ge film and photon-counting imaging system

Feifei Zhao^1,2, Baosheng Zhao¹, Xiaofeng Sai¹, Xinghua Zhang^1,2, Yonglin Wei¹, and Wei Zou¹

¹State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an 710119, China

²Graduate University of Chinese Academy of Sciences, Beijing 100049, China

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Feifei Zhao, Baosheng Zhao, Xiaofeng Sai, Xinghua Zhang, Yonglin Wei, Wei Zou, "Influence of annealing temperature on the performance of Ge film and photon-counting imaging system," Chin.Opt.Lett. 8, 361 (2010)

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Paper Information

Received: Jul. 22, 2009

Accepted: --

Published Online: Apr. 20, 2010

The Author Email:

DOI:10.3788/COL20100804.0361

Topics

laser devices and laser physics

Lasers and Laser Optics

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laser manufacturing

Instrumentation, Measurement and Metrology