[1] [1] Wang Yangyuan, Kang Jinfeng. Development and challenges of lithography for ULSI ［J］. Chinese J. Semiconductors, 2002, 23(3): 225～228

[2] [2] Paul Luehrmann, Peter van Ooschot, Hans Jasper et al.. 0.35 μm lithography using off-axis illumination [C]. SPIE, 1993, 1927: 103～124

[3] [3] Sun Zhiyuan, Li Yanqiu. Spatial frequency analysis of resolution enhancement technology［J］. Acta Optica Sinica, 2007, 27(10): 1758～1760

[4] [4] Guo Liping, Huang Huijie, Wang Xiangchao. Off-axis illumination for optical lithography［J］. Laser Journal, 2005, 26(1): 23～24

[5] [5] Moh Lung Ling, Gek Soon Chua, Qunying Lin et al.. Customized illumination shapes for 193 nm immersion lithography［C］. SPIE, 2008, 6924: 35-1～35-11

[6] [6] Nishinaga.. Exposure apparatus and exposure method capable of controlling illumination distribution [P]. US, 20040239904, 2004

[7] [7] Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography ［J］. Optics and Precision Engineering, 2008, 16(11): 2082～2085

[8] [8] H. Ganser, M. Darscht, Yuri V. Miklyaev et al.. High-throughput homogenizers for hyper-NA illumination systems ［C］. SPIE, 2006, 6154: 2N-1～10

[9] [9] Ding Yi, Gu Peifu. Freeform reflector for uniform illumination [J]. Acta Optica Sinica, 2007, 27(3): 540～544

[10] [10] Cheng Haobo, Feng Yunpeng, Wang Yongtian. Research on free-form optics［J］. Laser & Optoelectronics Progress, 2009, 46(12): 17～22

[11] [11] Yang Bo, Wang Yongtian. Computer aided design of free form reflector［J］. Acta Optica Sinica, 2004, 24(6): 721～724

[12] [12] Harald Ries, Julius Muschaweck. Tailored freeform optical surfaces ［J］. J. Opt. Soc. Am. A, 2002, 19(3): 590～595

[13] [13] B. A. Jacobson, R. D. Gengelbach. Lens for uniform LED illumination: an example of automated optimization using monte carlo ray-tracing of an LED source［C］. SPIE, 2001, 4446: 121～128

[14] [14] Andreas Timinger, Julius Muschaweck, Harald Ries. Designing tailored freeform surfaces for general illumination ［C］. SPIE, 2003, 5186: 128～132

[15] [15] Harald Ries, Ari Rabl. Edge-ray principle of nonimaging optics [J]. J. Opt. Soc. Am. A, 1994, 11(10): 2627～2632

[16] [16] Florian R. Fournier, William J. Cassarly, Jannick P. Rolland. Fast freeform reflector generation using source-target maps [J]. Opt. Express, 2010, 18(5): 5295～5304

[17] [17] David F. Rogers. An introduction to NURBS: with Historical Perspective [M]. USA: Morgan Kaufmann Publishers, 2001, 10: 129～135