Laser & Optoelectronics Progress, Volume. 58, Issue 19, 1924002(2021)
Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser
Figures & Tables(8)
Fig. 3. Laser damage threshold of different substrate materials and cleaning process
Fig. 4. Damage morphology under different working vacuum. (a) 7×10-3 Pa; (b) 9×10-3 Pa; (c) 2×10-2 Pa; (d) 3×10-2 Pa
Fig. 6. Laser damage threshold of thin film samples under different working vacuum
Table 1. Method for preparing group Ⅰ samples
View tableTable 1. Method for preparing group Ⅰ samples
Method S11 S12 S13 S14 Cleaning method Sconcentration of acidoaking in certain Deionized water heating ultrasonic cleaning Sconcentration of acidoaking in certain Deionized water heating ultrasonic cleaning Substrate material Quartz Quartz K9 K9
Table 2. Method for preparing group Ⅱ samples
View tableTable 2. Method for preparing group Ⅱ samples
Method S21 S22 S23 S24 Working vacuum /Pa 7×10-3 9×10-3 2×10-2 3×10-2
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Qiuhui Zhuang, Sanqiang Wang. Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser[J]. Laser & Optoelectronics Progress, 2021, 58(19): 1924002
Paper Information
Category: Optics at Surfaces
Received: Dec. 31, 2020
Accepted: Mar. 2, 2021
Published Online: Oct. 14, 2021
The Author Email: Zhuang Qiuhui (zqh@cqut.edu.cn)
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