Optics and Precision Engineering, Volume. 30, Issue 10, 1181(2022)
Grating X-ray collimator supported by Si3N4 membrane with large aspect ratio written directly by electron beam
Fig. 6. Simulation results and experimental results of EBL etching of different dose etching, the blue figure is the simulation result, and the gray figure is the SEM image of EBL experimental result at the same dose
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Yijie LI, Jun XIAO, Yifang CHEN, Xujie TONG, Chengyang MU. Grating X-ray collimator supported by Si3N4 membrane with large aspect ratio written directly by electron beam[J]. Optics and Precision Engineering, 2022, 30(10): 1181
Category: Micro/Nano Technology and Fine Mechanics
Received: Oct. 16, 2021
Accepted: --
Published Online: Jun. 1, 2022
The Author Email: CHEN Yifang (yifangchen@fudan.edu.cn)