Acta Optica Sinica, Volume. 42, Issue 13, 1305002(2022)
Fast Mask Optimization Method for Extreme Ultraviolet Lithography
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Zinan Zhang, Sikun Li, Xiangzhao Wang, Wei Cheng. Fast Mask Optimization Method for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2022, 42(13): 1305002
Category: Diffraction and Gratings
Received: Dec. 23, 2021
Accepted: Jan. 10, 2022
Published Online: Jul. 15, 2022
The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)