Fast Mask Optimization Method for Extreme Ultraviolet Lithography

Zinan Zhang; Sikun Li; Xiangzhao Wang; Wei Cheng

doi:10.3788/AOS202242.1305002

Acta Optica Sinica, Volume. 42, Issue 13, 1305002(2022)

Fast Mask Optimization Method for Extreme Ultraviolet Lithography

Zinan Zhang^1,2, Sikun Li^1,2、*, Xiangzhao Wang^1,2、**, and Wei Cheng^1,2

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Zinan Zhang, Sikun Li, Xiangzhao Wang, Wei Cheng. Fast Mask Optimization Method for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2022, 42(13): 1305002

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Paper Information

Category: Diffraction and Gratings

Received: Dec. 23, 2021

Accepted: Jan. 10, 2022

Published Online: Jul. 15, 2022

The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/AOS202242.1305002

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