Semiconductor Optoelectronics, Volume. 41, Issue 5, 681(2020)

Analysis and Improvement of the Graphic Distortion in Mask Copying Process

SHU Mingyang*... ZHOU Wen and CHEN Donghao |Show fewer author(s)
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    References(3)

    [3] [3] Jackson C, Buck P, Cohen S. DUV laser lithography for photomask fabrication[C]// Proc. 23th Annual BACUS Symp. on Photomask Technol., 2003, 5256: 30-41.

    [4] [4] Jackson C, Kiefer R, Buck P. Print characterization of photomasks from next-generation deep-ultra-violet laser pattern generator[C]// Proc. Photomask and Next-Generation Lithography Mask Technology Ⅻ., 2005, 5853: 387-397.

    [5] [5] Pang Linyong, Shamma N, Rissman P. Laser and E-beam mask-to-silicon with inverse lithography technology[C]// Proc. 25th Annual BACUS Symp. on Photomask Technol., 2005, 599221: 1-10.

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    SHU Mingyang, ZHOU Wen, CHEN Donghao. Analysis and Improvement of the Graphic Distortion in Mask Copying Process[J]. Semiconductor Optoelectronics, 2020, 41(5): 681

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    Paper Information

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    Received: Apr. 8, 2020

    Accepted: --

    Published Online: Jan. 19, 2021

    The Author Email: Mingyang SHU (smy7151@126.com)

    DOI:10.16818/j.issn1001-5868.2020.05.015

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