CMOS Image Sensor Design with Global/Rolling Exposure Compatibility, High Dynamics, and Radiation Resistance

LI Ming; LIU Geyang; FU Jing; LIU Changju; NI Piao; JIANG Junxian; REN Siwei

doi:10.16818/j.issn1001-5868.2024022202

Semiconductor Optoelectronics, Volume. 44, Issue 4, 568(2024)

CMOS Image Sensor Design with Global/Rolling Exposure Compatibility, High Dynamics, and Radiation Resistance

LI Ming1... LIU Geyang1, FU Jing2, LIU Changju1, NI Piao1, JIANG Junxian1 and REN Siwei1 |Show fewer author(s)

Author Affiliations

¹Chongqing Optoelectronics Research Institute, Chongqing 400060, CHN

²National Key Laboratory of Integrated Circuits and Microsystems, Chongqing 400060, CHN

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LI Ming, LIU Geyang, FU Jing, LIU Changju, NI Piao, JIANG Junxian, REN Siwei. CMOS Image Sensor Design with Global/Rolling Exposure Compatibility, High Dynamics, and Radiation Resistance[J]. Semiconductor Optoelectronics, 2024, 44(4): 568

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Paper Information

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Received: Feb. 22, 2024

Accepted: Feb. 13, 2025

Published Online: Feb. 13, 2025

The Author Email:

DOI:10.16818/j.issn1001-5868.2024022202

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

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