Journal of Semiconductors, Volume. 45, Issue 3, 032301(2024)
Reliable ferroelectricity down to cryogenic temperature in wake-up free Hf0.5Zr0.5O2 thin films by thermal atomic layer deposition
Fig. 1. (Color online) (a) The P−E hysteresis curves of HZO capacitor at its pristine state and after 103 cycles. The inside illustration is a schematic diagram of HZO capacitor devices during electrical measurements. (b) The GI-XRD diffractogram of HZO thin film at an incident angle of 0.5°. (c) A cross-sectional TEM image of the HZO capacitor. (d) The fast Fourier transform pattern from the HR-TEM image in the yellow box in (c).
Fig. 2. (Color online) (a) The J−E curves of TiN/HZO/TiN capacitor ranging from 300 to 30 K. (b) The fitting results of the leakage current at temperatures from 300 to 130 K by the P−F emission at 300, 200, and 130 K. (c) The fitting plot of the leakage current at 30 K by the F−N tunneling. (d) The typical P−E curves of HZO capacitors at temperatures from 300 to 30 K under 3.0 MV/cm. (e) The statistical results of ±Pr values at temperatures from 300 to 30 K. The inset shows the typical PUND curves at various temperatures under 3.0 MV/cm. (f) εr−E curves of HZO capacitors in the temperature ranging from 300 to 30 K.
Fig. 3. (Color online) The PUND curves of HZO capacitors at different temperatures under (a) 2.5 MV/cm, (b) 2.0 MV/cm, and (c) 1.5 MV/cm. (d) The averaged Ec values at different temperatures. (e) The 2Pr values at different temperatures. (f) The relationship between 2Pr values with temperature in previous reports and this work. The 2Pr values in this work are from PUND data under 3.0 and 2.5 MV/cm. The letter W and P stand for woken-up state and pristine state, respectively. The applied electric fields are indicated on the right.
Fig. 4. (Color online) Endurance characteristics of HZO capacitors under 2.5 MV/cm at 300 and 30 K.
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Shuyu Wu, Rongrong Cao, Hao Jiang, Yu Li, Xumeng Zhang, Yang Yang, Yan Wang, Yingfen Wei, Qi Liu. Reliable ferroelectricity down to cryogenic temperature in wake-up free Hf0.5Zr0.5O2 thin films by thermal atomic layer deposition[J]. Journal of Semiconductors, 2024, 45(3): 032301
Category: Articles
Received: Aug. 30, 2023
Accepted: --
Published Online: Apr. 24, 2024
The Author Email: Jiang Hao (HJiang), Wei Yingfen (YFWei)