Chinese Journal of Lasers, Volume. 45, Issue 5, 501002(2018)

Fabrication of Highly Reliable Watt-Level 660 nm Semiconductor Lasers

Zhu Zhen1, Zhang Xin1, Xiao Chengfeng1, Li Peixu1, Sun Sujuan1, Xia Wei1,2、*, and Xu Xiangang1,3
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  • 1[in Chinese]
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  • 3[in Chinese]
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    References(16)

    [3] Sumpf B, Zorn M, Staske R et al. 3-W broad area lasers and 12-W bars with conversion efficiencies up to 40% at 650 nm[J]. IEEE Journal of Selected Topics Quantum Electronics, 13, 1188-1193(2007).

    [5] Sumpf B, Zorn M, Staske R. et al. High-efficient 650 nm laser bars with an output power of about 10 W and a wall-plug efficiency of 30%[J]. SPIE, 6133, 61330D(2006).

    [15] Xu Y. Fabrication of 650 nm high-power single-mode AlGaInP semiconductor laser diodes and its reliability analysis Beijing: Institute of Semiconductors,[D]. Chinese Academy of Sciences, 32-40(2005).

    CLP Journals

    [1] Zhu Zhen, Xiao Chengfeng, Xia Wei, Zhang Xin, Su Jian, Li Peixu, Xu Xiangang. Design and Fabrication of High Power 640 nm Red Laser Diodes[J]. Laser & Optoelectronics Progress, 2018, 55(8): 81403

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    Zhu Zhen, Zhang Xin, Xiao Chengfeng, Li Peixu, Sun Sujuan, Xia Wei, Xu Xiangang. Fabrication of Highly Reliable Watt-Level 660 nm Semiconductor Lasers[J]. Chinese Journal of Lasers, 2018, 45(5): 501002

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    Paper Information

    Category: laser devices and laser physics

    Received: Nov. 7, 2017

    Accepted: --

    Published Online: May. 21, 2018

    The Author Email: Wei Xia (sps_xiaw@ujn.edu.cn)

    DOI:10.3788/CJL201845.0501002

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