Optics and Precision Engineering, Volume. 19, Issue 8, 1810(2011)

Process of spherical photoresist spin coating

LIU Xiao-han1...2,*, FENG Xiao-guo1, ZHAO Jing-li1, GAO Jin-song1, ZHANG Hong-sheng1 and CHENG Zhi-feng1 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(12)

    [1] [1] Xie Y J. Surface laser direct writing technology [D].Beijing: Graduate university of the Chinese Academy of Science, 2003. (in Chinese)

    [2] [2] FU Y Q, Li F Y. Centrifugal coating process analysis and simulation parameters[J]. Opt. Precision Eng.,1998, 6(4): 75-80.(in Chinese)

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    [5] [5] MEYERHOFER D. Characteristics of resist film produced by spinning[J].Appl.Phys,1978,49(7): 3993-3997.

    [6] [6] DAUGHTON W J,GIVENS F L. An investigation of the thickness variation of spun on thin film commonly associated with the semiconductor industry[J].Electrochem.Soc,1982,129(1): 173-179.

    [8] [8] FENG X G, SUN L C. Mathematical model of spin-coated photoresist on a spherical substrate[J]. Optics Express,2005,18(13): 7070-7075.

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    LIU Xiao-han, FENG Xiao-guo, ZHAO Jing-li, GAO Jin-song, ZHANG Hong-sheng, CHENG Zhi-feng. Process of spherical photoresist spin coating[J]. Optics and Precision Engineering, 2011, 19(8): 1810

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    Paper Information

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    Received: Dec. 2, 2010

    Accepted: --

    Published Online: Aug. 29, 2011

    The Author Email: Xiao-han LIU (liuxiaohanciomp@sohu.com)

    DOI:10.3788/ope.20111908.1810

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