Optics and Precision Engineering, Volume. 31, Issue 13, 1909(2023)

Ultra-precision cutting of photoresist mask for ultra-smooth surface

Qiuyi LI1... Tianfeng ZHOU1,2, Jia ZHOU1, Junjian HU3, and Bin ZHAO12,* |Show fewer author(s)
Author Affiliations
  • 1School of Mechanical Engineering, Beijing Institute of Technology, Beijing0008, China
  • 2Beijing Institute of Technology Chongqing Innovation Center, Chongqing40110, China
  • 3Jiangxi Lianchuang Electronic Technology Co., Ltd., Nanchang0000, China
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    Figures & Tables(27)
    Dynamic properties of polymer as function of time
    Thermomechanical property test of photoresist SU8
    Simulation model of cutting
    Load-depth curve of photoresist SU8
    Stress-strain curve of photoresist SU8
    Schematic of machine tool movement
    Schematic diagram of face turning
    Effect of cutting speed on surface roughness
    Effects of cutting speed on cutting force
    Effects of cutting speed on cutting temperature
    SEM micrographs of photoresist SU8 under different cutting speeds
    Effect of feed rate on surface roughness
    Effects of feed rate on cutting force
    SEM micrographs of photoresist SU8 under different feed rates
    Effect of depth of cut on surface roughness
    Effects of depth of cut on cutting force
    Effects of depth of cut on cutting temperature
    SEM micrographs of photoresist SU8 under different depths of cutting
    Effect of rake angle on surface roughness
    Effect of rake angle on cutting force
    Effects of depth of cut on cutting temperature
    SEM micrographs of photoresist SU8 under different rake angles
    SEM micrographs of SU8 face turning
    Morphology of microlens array
    • Table 1. Preparation process parameters of photoresist SU8 film

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      Table 1. Preparation process parameters of photoresist SU8 film

      ProcessProcess parameter
      Plasma clean100 mL/min O2,3 min
      Spin coating565 r/min, 40 s
      Pre-bake65 ℃, 10 min; 95 ℃, 60 min
      Exposure365 nm, 650 mJ/cm2, 24 s
      Post-bake65 ℃, 10 min; 95 ℃, 30 min
    • Table 2. Mechanical parameters of photoresist SU8

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      Table 2. Mechanical parameters of photoresist SU8

      Elastic modulus/GPaHardness/GPaYield strength/MPaStrain-hardening exponentHardening coefficient
      4.370.29359.8690.7671.608
    • Table 3. Cutting parameters

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      Table 3. Cutting parameters

      Cutting parameterValue
      Spindle speed n/(r·min-11 000
      Feed rate vf /(mm·min-11,5,10
      Depth of cut ap/μm2,4,8
      Rake angle α/(°)0,-25
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    Qiuyi LI, Tianfeng ZHOU, Jia ZHOU, Junjian HU, Bin ZHAO. Ultra-precision cutting of photoresist mask for ultra-smooth surface[J]. Optics and Precision Engineering, 2023, 31(13): 1909

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    Paper Information

    Category: Micro/Nano Technology and Fine Mechanics

    Received: Jan. 29, 2023

    Accepted: --

    Published Online: Jul. 26, 2023

    The Author Email: ZHAO Bin (bin.zhao@bit.edu.cn)

    DOI:10.37188/OPE.20233113.1909

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