Optics and Precision Engineering, Volume. 31, Issue 13, 1909(2023)

Ultra-precision cutting of photoresist mask for ultra-smooth surface

Qiuyi LI1... Tianfeng ZHOU1,2, Jia ZHOU1, Junjian HU3, and Bin ZHAO12,* |Show fewer author(s)
Author Affiliations
  • 1School of Mechanical Engineering, Beijing Institute of Technology, Beijing0008, China
  • 2Beijing Institute of Technology Chongqing Innovation Center, Chongqing40110, China
  • 3Jiangxi Lianchuang Electronic Technology Co., Ltd., Nanchang0000, China
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    The cutting characteristics of the polymer determine the processing quality of the microstructure. Considering photoresist SU8 as the representative polymer in this research, the cutting characteristics of the photoresist mask were studied through experimental analysis and simulations. The stress-strain relationship of SU8 was analyzed via the nanoindentation method, and a cutting simulation model of SU8 based on the energy method was established. Next, the cutting characteristics of SU8 under different cutting parameters were simulated using AdvantEdge FEM. Finally, an experiment involving ultra-precision machining of SU8 was performed. According to the simulation and test results, the effects of the cutting parameters and tool rake angle on the surface quality were analyzed, and the cutting parameters of SU8 were optimized. The results demonstrat that the surface roughness decreases with an increase in the cutting speed and increases with the feed rate and depth of cut. Within the scope of the experimental conditions, when the cutting speed is 2.09 m/s, the feed speed is 1 mm/min, the depth of cut is 2 μm, and the tool rake angle is 0°; the surface roughness Ra of the photoresist reaches the optimum value of 7.4 nm, and there are no microfractures. Finally, according to the test and simulation results, the processing parameters were optimized, and a microlens array mask structure was fabricated on SU8 with high precision.

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    Qiuyi LI, Tianfeng ZHOU, Jia ZHOU, Junjian HU, Bin ZHAO. Ultra-precision cutting of photoresist mask for ultra-smooth surface[J]. Optics and Precision Engineering, 2023, 31(13): 1909

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    Paper Information

    Category: Micro/Nano Technology and Fine Mechanics

    Received: Jan. 29, 2023

    Accepted: --

    Published Online: Jul. 26, 2023

    The Author Email: ZHAO Bin (bin.zhao@bit.edu.cn)

    DOI:10.37188/OPE.20233113.1909

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