Optics and Precision Engineering, Volume. 16, Issue 4, 636(2008)

Fabrication process analysis for nano-positioning stage based on silicon bulk micromachining

[in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(4)

    [2] [2] GREGORY T A K,NADIM I M,KURT E P.Bulk micromachining of silicon[J].IEEE,1998,86(8):1536-1551.

    [3] [3] YANG Z X,LI X X,WANG Y L,et al..Mico cantilever probe array with integtation of electro-thermal nano tip and piezoresistive sensor[C].Proceedings of the 2003 IEEE International Conference:830-833.

    [5] [5] LEE C S B,HAN S,MACDONALD N C.Single crystal silicon(SCS)XY-stage fabricated by DRIE and IR alignment[C].Proceedings of the 2000 IEEE Conference on MEMS,No.00CH3608.

    [6] [6] SUN L N,WANG J CH,RONG W B,et al..Analysis and design for the nano-positioning XY-stage based on the MEMS technology[C].Proceedings of the 2007 IEEE International Conference on Mechatronics and Automation,Harbin,August 2007:1489-1494.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication process analysis for nano-positioning stage based on silicon bulk micromachining[J]. Optics and Precision Engineering, 2008, 16(4): 636

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    Paper Information

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    Received: Oct. 29, 2007

    Accepted: --

    Published Online: Aug. 17, 2008

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