[1] Baba M, Sasaki T, Yoshiya M et al. Aberrations and allowances for errors in a hemisphere solid immersion lens for submicron-resolution photoluminescence microscopy[J]. Journal of Applied Physics, 85, 6923-6925(1999). http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5023909

[2] Menegozzi L N, Lamb W E. Theory of a ring laser[J]. Physical Review A, 8, 2103-2125(1973). http://adsabs.harvard.edu/abs/1973PhRvA...8.2103M

[3] Webster S, Gill P. Low-thermal-noise optical cavity[C]. Frequency Control Symposium, 470-473(2010).

[4] Gu P F, Li H F, Zhang Y G et al. Uniformity of layer thickness of DWDM filters prepared by ion-beam sputtering and ion-assisted deposition[J]. Optical Technique, 27, 410-416(2001).

[5] Wen P G, Yan Y, Zhang G L et al. Influences of the process on thickness uniformity of films deposited by magnetron sputtering[J]. Journal of Aeronautical Materials, 27, 66-68(2007).

[6] Bai M S, Li P, Zhang J K et al. Improvement on nonuniformity for sphere mirrors with large radius of curvature[J]. Optics and Precision Engineering, 21, 554-560(2013).

[7] Zhang K, Geng Y Y, Wu Y Q et al. Dependence of optical properties on thickness of Sb2Te3 film[J]. Acta Optica Sinica, 31, 1231002(2011).

[8] Jin Y L, Qiu Y, Zhao H et al. Deposition of coatings with uniform thickness on large hemispherical substrate[J]. Chinese Journal of Vacuum Science and Technology, 34, 336-339(2014).

[9] Liu Q L, Yang C M, Zhang J F et al. Numerical calculation for optical film-thickness distribution of large curvature spherical accessory[J]. Journal of Applied Optics, 33, 1128-1132(2012).

[10] Ye Z J, Shen W D, Zhang Y G et al. Properties of iridium thin films fabricated by atomic layer deposition[J]. Acta Optica Sinica, 34, 1031002(2014).

[11] Zhao J L, He H B, Wang H et al. Influence of deposition rate on microstructure and optical properties of mo films fabricated by direct current pulse sputtering[J]. Acta Optica Sinica, 36, 0931001(2016).

[12] George S M. Atomic layer deposition: An overview[J]. Chemical Reviews, 110, 111-131(2010). http://pubs.acs.org/doi/abs/10.1021/cr900056b

[13] Johnson R W, Hultqvist A, Bent S F. A brief review of atomic layer deposition: From fundamentals to applications[J]. Materialstoday, 17, 236-246(2014). http://www.sciencedirect.com/science/article/pii/S1369702114001436

[14] Li Y H, Shen W D, Hao X et al. Rugate notch filter fabricated by atomic layer deposition[J]. Applied Optics, 53, A270-A275(2014). http://www.ncbi.nlm.nih.gov/pubmed/24514226

[15] Weber T, Kasebier T, Szeghalmi A et al. Iridium wire grid polarizer fabricated using atomic layer deposition[J]. Nanoscale Research Letters, 6, 1-4(2011). http://www.tandfonline.com/servlet/linkout?suffix=cit0064&dbid=16&doi=10.1080%2F05704928.2017.1328427&key=10.1186%2F1556-276X-6-558

[16] Li Y H, Shen W D, Zhang Y G et al. Precise broad-band anti-refection coating fabricated by atomic layer deposition[J]. Optics Communications, 292, 31-35(2013). http://www.sciencedirect.com/science/article/pii/S0030401812013880

[17] Pore V, Hatanpää T, Ritala M et al. Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and selenium[J]. Journal of the American Chemical Society, 131, 3478-3480(2009). http://pubs.acs.org/doi/abs/10.1021/ja8090388

[18] Puurunen R L. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process[J]. Journal of Applied Physics, 97, 121301-121352(2005). http://pubs.acs.org/servlet/linkout?suffix=ref1/cit1&dbid=16&doi=10.1021%2Facs.nanolett.5b01424&key=10.1063%2F1.1940727

[19] Triani G, Evans P J, Mitchell D R et al. Atomic layer depostion of TiO2/Al2O3 films for optical applications[C]. SPIE, 5870, 587009(2005).

[20] Liu J C. A studay on calculation method of vacuum system components gas flow simulation based on FLUENT[D]. Shenyang: Northeastern University(2010).

[21] Zhang D, He W J, Duan C L et al. Atomic layer deposition process optimization by computational fluid dynamics[J]. Vacuum, 123, 103-110(2015). http://www.sciencedirect.com/science/article/pii/S0042207X15301056

[22] Suh S, Park S, Lim H et al. Investigation on spatially separated atomic layer deposition by gas flow simulation and depositing Al2O3 films[J]. Journal of Vacuum Science & Technology A: Vacuum Surfaces & Films, 30, 051504(2012). http://scitation.aip.org/content/avs/journal/jvsta/30/5/10.1116/1.4737123