[1] [1] LIN Q, JIN CH SH, XIANG P, et al.. Computer-aided alignment of Schwarzchild objective with off-axis illumination ［J］. Opt. Precision Eng., 2003,11(2):144-150. (in Chinese)

[2] [2] RYULI H, NOBUHITO T, KIMIO I， et al..Optimazation of source distribution for half-wavelength DOE［J］. SPIE, 2006,6283:62838U.

[3] [3] SARA L, UMBERTO I, ROBERT C. Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90nm technology node imaging with off axis illuminations［J］. SPIE, 2006,6154:615434.

[4] [4] HSIUNG H, LING C L, LIN C L. Novel illumination apertures for resolution-enhanced technology and through-pitch critical dimension control［J］. SPIE, 2005,5754:1395-1404.

[5] [5] LIU W L, OUYANG J F, QU X H. Effect of incident laser beam angle varying on cube corner retro-reflector measurement accuracy ［J］. Opt. Precision Eng., 2009,17(2):286-291. (in Chinese)

[6] [6] LIU H, LU ZH W. Lateral splittable non-imaging concentrators with large acceptable angles ［J］. Opt. Precision Eng., 2009,17(12):2881-2886. (in Chinese)

[7] [7] ZHAO J Y. Calculation of the geometrical parameters of prisms with the similar complex vector method ［J］. Opt. Precision Eng., 1995,3(2):38-41. (in Chinese)

[8] [8] RIOUX M, TREMBLAY R, BELANGER P A. Linear,annular,and radial focusing with axicons and applications to laser machining［J］. Applied Optics, 1978,17:1532-1536.

[9] [9] ZHANG W, GONG Y. Design of diffractive optical elements for off-axis illumination in projection lithography ［J］. Opt. Precision Eng., 2008,16(11):2081-2086. (in Chinese)

[10] [10] HIDEKI K, KAVASAKI. Method and apparatus for illuminating a surface using a projection imaging apparatus：US，6563567［P］. 2003.

[11] [11] GARY Z, STEVE H. Illumination source mapping and optimization with resist based process metrics for low k1 imaging［J］. SPIE, 2004,5377:369-380.

[12] [12] SABITA R, DOUG V D B, FUNG C, et al..Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture,illumination and optical proximity correction［J］. SPIE, 2005,4(2):023003.

[13] [13] CREIGHTON M A. Influence of illumination non-uniformity on pattern fidelity［J］. SPIE, 2005,5754:1519-1528.

[14] [14] PARTLO W N,TOMPKINS P J,DEVA P G, et al.. Depth of focus and resolution enhancement for i-ling and deep-UV lithography using annular illumination［J］. SPIE, 1993,1927:137-142.

[15] [15] RICHARD R, GUY D, JAN M, et al.. Photolithography using the AERIARTM illuminator in a variable NA wafer stepper［J］. SPIE, 1996,2726:54-70.