The ion source electron beam evaporation method was used to fabricate ZnO films with Si as the base and TiO2 as the buffer layer. By further thermal insulation, and annealing treatment at different temperature conditions, different film samples were prepared for the surface morphology analysis and light scattering properties study. The experimental results show that annealing temperature has significant influence on the sample surface roughness, grain size, fractal dimension and other parameters, and the surface morphology analysis is helpful to understand the grain growth mechanisms of film and improve the film preparation process. The intensity and polarization degree of reflected light for different film samples have different response to different polarized lights, which has some relevance to the surface statistical properties of film samples. The light scattering properties study of thin films has some reference value for the study of depolarization effect for weak scattering random rough surface.