Based on the maxwell's equations, plasma excitation conditions were derived. Metal dielectric metal (MIM) periodic hole array films were prepared based on the principle of surface plasmon enhanced light transmission in subwavelength hole periodic arrays. This film structure can supplement the momentum imbalance between the incident light and plasma elements, and then successfully realize the excitation of surface plasma on the metal surface. Finally, the MIM periodic hole array structure was used to conduct laser micro-nano machining experiments and its role in laser micro-nano machining was explored. Monocrystalline silicon was selected as the object of laser micro-nano processing. The experimental results show that this kind of thin film structure can remove materials by inductively excited plasma, and a wide range of microporous structures can be prepared on the surface of silicon wafers.