Chinese Optics Letters, Volume. 11, Issue 5, 053002(2013)
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50–1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.
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Weijing Liu, Bincheng Li, "Repetition rate dependence of absorption of fused silica irradiated at 193 nm," Chin. Opt. Lett. 11, 053002 (2013)
Category: Spectroscopy
Received: Dec. 27, 2012
Accepted: Jan. 28, 2013
Published Online: Apr. 16, 2013
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