As the early developed laser direct writing device has low writing speed and its function is not perfect, a new compact system is designed and constructed. A 405 nm high-speed analog modulated semiconductor laser is used as the light source to make the structure more compact; the movement of the nano platform is adjusted to sinusoidal oscillating mode to increase writing speed; functions such as writing power calibration, sample observation based on complementary meta-oxide-semiconductor transistor (CMOS), blue light confocal imaging and ordinary photoresist writing are added. By recording focus date, writing light, auxiliary focusing light and sample observing light can work separately and will not interfere with each other. Experiments show that the system can plot or pattern vector and scalar graphics on arbitrary photosensitive films. It takes at least 100 s to finish writing 200 μm×200 μm writing area with writing feature size smaller than 250 nm.