Nanocrystalline ZnO films were deposited on quartz substrates by radio-frequency magnetron sputtering (RFMS) method. The authors discussed the effectcaused by the change in the ratio of oxygen to argon and quartz substratestemperature on the qualities of thin films and blue photoluminescence spectrum ofZnO films. Relationship between XRD intensity and FWHM of nanocrystalline ZnOfilms at different ratio of O2/Ar in processing was given. Photoluminescencespectrum (PL), absorption spectra (ABS), photoluminescence excitation spectrum(PLE) and X-ray diffraction pattern (XRD) of nanocrystalline ZnO film withexcitation wavelength 300 nm were measured at room temperature. XRD patternindicates that nanocrystalline ZnO film has a hexagonal wurtzite structure and ispolycrystalline. Blue visible emission bands (430-460 nm) were observed, and itscentral wavelength is 445 nm. The relationship between PL area of integration andPL intensity of maximum of nanocrystalline ZnO films at different ratio of O2/Arin processing was given. The luminescence emission peak located at 450 nmcorresponds to the transition from the shallow level of oxygen vacancy to valenceband or the interstitial.(2007RFXXG038)资助