Since the discovery of the extraordinary optical transmission phenomenon, nanohole arrays have attracted much attention and been widely applied in sensing. However, their typical fabrication process, utilizing photolithographic top-down manufacturing technologies, has intrinsic drawbacks including the high costs, time consumption, small footprint, and low throughput. This study presented a low-cost, high-throughput, and scalable method for fabricating centimeter-scale(1×2 cm2) nanohole arrays using the improved nanosphere lithography. The large-scale close-packed polystyrene monolayers obtained by the hemispherical-depression-assisted self-assembly method were employed as colloidal masks for the nanosphere lithography, and the nanohole diameter was tuned from 233 nm to 346 nm with a fixed period of 420 nm via plasma etching. The optical properties and sensing performance of the nanohole arrays were investigated, and two transmission dips were observed due to the resonant coupling of plasmonic modes. Both dips were found to be sensitive to the surrounding environment, and the maximum bulk refractive index sensitivity was up to 162.1 nm/RIU with a 233 nm hole diameter. This study offered a promising approach for fabricating large-scale highly ordered nanohole arrays with various periods and nanohole diameters that could be used for the development of low-cost and high-throughput on-chip plasmonic sensors.