Under identical exposure and Processing conditions, the exposure characteristics of the soft X-ray film SIOFM-5FW have been compared qualitatively with Kodak 101- 05and Ilford-Q plates in the soft x-ray and XUV ranges below 100. 0 nM, using D-19 and Phenisol developers. The experimental results have shown that for the radiation above 10. 0nm, the response of SIOFM-5FW lies between Kodak101-05 and Ilford-Q plate,but closely to the former and for the radiation below 10. 0 nm SIOFM-5FW is more sensitive than Kodak 101-05 plate, with a higher saturation density and dynamic range, and has an obvious K absorption eadge structure of carbon. The effects of the two developers on the exposure characteristics are discussed.