Chinese Journal of Lasers, Volume. 23, Issue 9, 796(1996)
Preliminary Study of Laser Plasma Submicron Lithography
Using high- power pulsed laser- produced plasma as a soft X- ray source forproximity lithography is described in this paper. By applying positive resist PMMA, somesubmicron lithography experiments are carried out.
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[in Chinese]. Preliminary Study of Laser Plasma Submicron Lithography[J]. Chinese Journal of Lasers, 1996, 23(9): 796
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